11/28/2006 -- Milpitas, CA - Nanometrics Incorporated supplier of advanced integrated and standalone metrology equipment to the semiconductor industry, recently announced it has entered into a cross-licensing agreement with ASML, one of the provider of lithography systems for the semiconductor industry.
“We are committed to offering our customers extendible, open-architecture Overlay and CD control solutions that scale beyond 32nm,” commented John Heaton, President and CEO of Nanometrics. “We are extremely pleased to be working with ASML to create solutions that improve lithography performance and economics.”
“Metrology within the scanner is a key element for the current performance of ASML lithography systems. With increased access to advanced metrology technology we see further opportunities for advancements in lithography and wafer patterning,” stated Karel van der Mast, senior vice president of ASML.
SOURCE: - Nanometrics Incorporated and ASML
