Tokyo, July 11, 2006 (JCN) - Hitachi High-Technologies, a leading manufacturer of electron microscopes, has launched DesignGauge, a system that automatically generates metrology design recipes based on design information.
The Windows system compares and verifies the semiconductor pattern that has been transferred to the wafer against the design information with a high degree of precision. Compared with the conventional system, it is capable of generating metrology recipes off line.
DesignGauge also features a remotely controlled scanning electron microscope. In addition, it can measure differences between CAD data and actual semiconductor patterns, reducing time to acquire images to 1/5 the time it takes with conventional approaches.
